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Nanolithography and Patterning Techniques in Microelectronics D Bucknall

By: Material type: TextTextPublication details: USA CRC 2005Description: 424 pISBN:
  • 9781855739314
DDC classification:
  • 621.381 BUC
Contents:
Copolymer ordering; Templated synthesis for controlled 3D structural control; Surface-induced structure formation of polymer blends; Rapid prototyping of functional microfabricated devices by soft lithography; Control of polymer topography; AFM based patterning; Patterning of confined polymer thin films; Ion beam patterning; Nanoprinting techniques; Photolithography beyond the diffraction limit; Standard printing techniques for unconventional methods; Microfluidics; Manipulation of biomolecules and reactions; Fabrication of organic display devices; Printing techniques for plastic electronics.
Summary: Techniques such as surface patterning have facilitated the emergence of advanced polymers with applications in areas such as microelectronics. Surface patterning of polymers has conventionally been undertaken by optical lithography. However, a new generation of nanolithographic and patterning techniques has made it possible to develop complex patterns at the nanoscale. Non-conventional lithography and patterning summarises this new range of techniques and their industrial applications.A number of chapters look at ways of forming and modifying surfaces for patterning. These are complemented by chapters on particular patterning techniques such as soft lithography, ion beam patterning, the use of nanostencils, photolithography and inkjet printing. The book also discusses prototyping and the manufacture of particular devices.With its distinguished international team of contributors, Non-conventional lithography and patterning is a standard reference for both those researching and using advanced polymers in such areas as microelectronics and biomedical devices.
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Item type Current library Collection Call number Status Date due Barcode
Reference Reference IIITDM Kurnool General Stacks Reference 621.381 BUC (Browse shelf(Opens below)) Not For Loan (Restricted Access) 0005283

Copolymer ordering; Templated synthesis for controlled 3D structural control; Surface-induced structure formation of polymer blends; Rapid prototyping of functional microfabricated devices by soft lithography; Control of polymer topography; AFM based patterning; Patterning of confined polymer thin films; Ion beam patterning; Nanoprinting techniques; Photolithography beyond the diffraction limit; Standard printing techniques for unconventional methods; Microfluidics; Manipulation of biomolecules and reactions; Fabrication of organic display devices; Printing techniques for plastic electronics.

Techniques such as surface patterning have facilitated the emergence of advanced polymers with applications in areas such as microelectronics. Surface patterning of polymers has conventionally been undertaken by optical lithography. However, a new generation of nanolithographic and patterning techniques has made it possible to develop complex patterns at the nanoscale. Non-conventional lithography and patterning summarises this new range of techniques and their industrial applications.A number of chapters look at ways of forming and modifying surfaces for patterning. These are complemented by chapters on particular patterning techniques such as soft lithography, ion beam patterning, the use of nanostencils, photolithography and inkjet printing. The book also discusses prototyping and the manufacture of particular devices.With its distinguished international team of contributors, Non-conventional lithography and patterning is a standard reference for both those researching and using advanced polymers in such areas as microelectronics and biomedical devices.

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